Delay
& Wire Variation
CE-653 - Introduction and
Fundamentals
17
}Wire pitch is well controlled in modern processes
}Pitch is determined by mask precision itself
}Width and space individually is not
}Width and space depend on etching and photoresist
K Kuhn, C. Kenyon, et al. “Managing Process Variation in Intel's 45 nm. CMOS Technology.” Intel Technology Journal, vol. 12, no. 2, Jun. 2008